High Purity Titanium Target
Description:
The word "target" in "titanium sputtering target" comes from the common shooting targets in our daily life. During the sputter deposition process, the coating material is bombarded by an electron beam or an ion beam, just like the target is shot, so the material used in the sputtering process is named "sputter target".
Specifications:
| Product Name | titanium target |
| Purity | 99.99% |
| Delivery time | 7-15 days |
| Application | Used for coating |
Application:
Titanium sputtering targets have the same properties as their source materials. High Purity Ti Target is widely distributed in the earth's crust (about 0.4%). The world's titanium reserves are approximately 3.4 billion tons, ranking 9th among all elements. Titanium is a material with high commercial value. Due to its high strength, good corrosion resistance, high heat resistance and other advantages, it is widely used in daily life fields such as aerospace, automobile manufacturing, medical and health care.
Purity: Purity has a great influence on the performance of films produced by sputter coating. Taking Titanium alloy sputtering target as an example, the higher the purity, the better the corrosion resistance and electrical and optical properties of the sputtered film.
Impurity content: Impurities in the target solid and oxygen and water vapor in the pores are the main sources of pollution for deposited films. Target materials for different uses have different requirements for their impurity content.
Density: The density of the target not only affects the sputtering rate, but also affects the electrical and optical properties of the film. Therefore, in order to reduce the pores in the High Purity Ti Target solid and improve the performance of the sputtered film, the target material is usually required to have a higher density.
Preparation Of Titanium Alloy Sputtering Target
Titanium alloy sputtering target is a titanium product made of titanium metal as raw material, used for sputtering coating to produce titanium thin films. Simply put, there are two methods for manufacturing titanium sputtering targets from titanium metal - casting and powder metallurgy.
Casting: melt a certain proportion of raw materials, pour the alloy solution into a mold to form an ingot, and finally machine it into a sputtering target. The method is to smelt and cast in a vacuum.
Powder metallurgy: melt raw materials with a certain distribution ratio, cast them into ingots and then crush them. The powder is isostatically pressed and then sintered at high temperature to finally form a target.
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High Purity Titanium Target Round Sputtering Coating Of Tools Images
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